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An Hui's First Photolithography Mask was Successfully Unveild

According to the official WeChat news of Crystal Integration, the first semiconductor lithography mask in Anhui Province produced by Crystal Integration was successfully unveiled, which not only filled the gap in Anhui Province in this field, but also further enhanced the competitiveness of the local semiconductor industry.

Crystal Integration currently provides 28-150nm lithography mask services, and is scheduled to be officially mass-produced in the fourth quarter of this year. The reticle is the link between chip design and manufacturing, which is used to carry the design pattern, and transfer the design pattern to the photoresist through light transmission, which is an indispensable part of the lithography process.

Since it settled in Hefei Comprehensive Bonded Zone in 2015, it has been focusing on the development of semiconductor wafer foundry. As the first 12-inch wafer foundry in Anhui Province, Crystal Integration has played an important role in promoting the development of the local semiconductor industry. Jinghe Integration has always focused on investment in technology research and development, and constantly improved its technical strength and innovation capabilities. At present, Crystal Integration can provide lithography mask services from 28 to 150 nm, and plans to officially mass produce in the fourth quarter of this year.

In addition, the service scope of crystal integration covers the design, manufacturing, testing and certification of lithography masks, providing customers with a full range of service support.

Figure: Anhui's first lithography mask was successfully unveiled (Source: SEMI)

At present, 90% of the raw materials are supplied by domestic manufacturers, and the goal of 100% localization has been set. In the field of equipment, the localization rate of the incremental part has reached 30%, and the equipment of the new plant in the future is given priority to domestic manufacturers, and domestic equipment is introduced as much as possible. In terms of technology research and development, Jinghe has established a complete R&D innovation system, and built a R&D platform for 150nm, 110nm, 90nm, 55nm and other processes, covering DDIC, CIS, MCU, PMIC, E-Tag, Mini LED and other logic chips, realizing comprehensive coverage of consumer, industrial, automotive and other application fields.

In the future, we will continue to increase investment in technology research and development, promote the continuous progress of lithography mask technology, and quickly build a business segment of crystalline lithography reticle to provide better services for more customers.

From focusing on display driver chip foundry to expanding the five major spindle products, from focusing on wafer foundry to providing lithography mask services, Jinghe Integration has been committed to seeking diversified growth space, providing strong support for increasing revenue and expanding profits, and also striving for the localization of the semiconductor industry.


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