Energetiq Technology, a subsidiary of Hamamatsu Photonics and a leader in high-performance light sources for semiconductor and scientific applications, recently introduced the EQS-10, a new generation of electrodeless Z-Pinch extreme ultraviolet (EUV) light source, a major advancement in metrology. The EQS-10 is based on a field-proven platform with four times the energy per pulse and operating at frequencies up to 5 kHz. It uses advanced solid-state switching technology to ensure ultra-high efficiency, making it the solution of choice for demanding EUV applications such as EUV metrology, photoresist development, and defect detection.
The EQS-10 integrates Energetiq's unique direct fuel system that can reduce gas consumption by up to 60%, providing an efficient and cost-effective solution for the semiconductor industry. This translates into a 25% reduction in cost per watt, enabling organizations to achieve higher performance while reducing operational costs. Features of the EQS-10 EUV light source include:
- Unrivalled energy output: four times the energy per pulse compared to the previous generation.
- High-frequency operation: Operating frequencies up to 5 kHz ensure maximum performance for advanced applications.
- Lower cost of ownership: Reduce gas usage by up to 60% and cost per watt by 25%.
- Pre-ionization control: Improves z-pinch efficiency and enables tunability of different gases.
- Proven reliability: 60 EUV light sources are currently installed, supported by Energetiq's full support network.
Pictured: Energetig introduces a new generation of EUV light sources
Energetiq's electrodeless Z-Pinch™ EUV light source technology continues to set the standard for EUV and soft X-ray light sources. The EQS-10 maintains the low fragmentation, long hole life and high spatial stability that customers expect, ensuring minimal downtime and maximizing operational efficiency. Backed by Hamamatsu Photonics' global network, the EQS-10 is not only a product, but also a reliable solution that adapts to the needs of the industry.
In addition, Energetiq's EQ-10R, which is based on electrodeless Z-Pinch™ technology and uses xenon as a light source, has become ideal for EUV research and development projects. Compact, easy to use, reliable and cost-effective, the EQ-10R's modular design is easy to integrate into your process. The system is capable of delivering up to 10 watts of EUV light and can operate continuously at pulse repetition rates of up to 2 kHz.
Energetiq's EUV light sources feature a unique design that minimizes heat load and reduces debris, enabling you to control peak brightness and peak power while providing a compact, modular unit. The reliability and ease of use of these light sources are ideal for photoresist R&D, with minimal thermal load, excellent spatial stability, high repetition rate, stable repeatable power output, simple and flexible optical interface, and CE marking and SEMI S2-0715 compliance.
The development of Energetiq Technology's EUV light source technology has undoubtedly supported advances in advanced lithography, mask blank detection, materials research, and life sciences in semiconductor manufacturing and scientific applications.
