According to media reports, Multibeam recently launched the semiconductor industry's first multi-column electron beam photonic lithography (MEBL) system for mass production.
Traditional electron beam lithography systems are limited by the capacity bottleneck of a single electron beam column, which makes it difficult to meet the growing demand for semiconductor production. Multibeam's MEBL system completely breaks this limitation and enables the simultaneous cooperation of multiple miniature electron beam columns through multi-column parallel technology. This revolutionary design not only dramatically improves production efficiency, but also maintains high accuracy and consistency, opening up completely new possibilities for semiconductor manufacturing.
According to Multibeam's official introduction, its MEBL system has more than 100 times higher throughput than traditional EBL systems, making it one of the most efficient high-resolution maskless lithography systems on the market. This astonishing improvement is made possible by an advanced control system and precise electron beam guidance technology, which together ensure that the accuracy and quality of the pattern is maintained even in high-speed production mode. This means that semiconductor manufacturers can produce more high-quality chips in less time, resulting in faster time-to-market and greater market competitiveness.
The MEBL system is highly flexible and can easily meet the needs of a variety of application scenarios such as rapid prototyping, advanced packaging, high-mix production, chip ID, compound semiconductors, etc. This flexibility allows semiconductor manufacturers to be more agile in responding to market changes and customer needs.
Figure: Multibeam introduces the semiconductor industry's first multi-column electron beam photonic lithography system for mass production (Source: Multibeam)
Multibeam's MEBL system is not only suitable for traditional mass production scenarios, but also offers a high degree of flexibility and versatility. It can easily meet the needs of rapid prototyping, advanced packaging, high-mix production, chip ID, compound semiconductors and other application scenarios. This versatility makes MEBL systems an indispensable tool for semiconductor manufacturers, whether for R&D teams that need to change designs frequently, or for customized markets that pursue low-volume, high-mix production.
At present, companies in the semiconductor industry have ordered Multibeam's MEBL system, such as SkyWater in the semiconductor industry, which has been the first to order Multibeam's first MEBL system.
Dr. David K. Lam, Chairman and CEO of Multibeam, said, "We are excited to launch the MB platform and are proud to have sent our first production system to SkyWater. The growth of the semiconductor industry continues to be driven by exciting new applications, with advanced lithography driving endless innovation. At the same time, markets such as AI and edge computing are skyrocketing, driven by specialized silicon and advanced packaging, with manufacturers top priorities for fast learning cycles and a cost-effective, seamless transition to production to accelerate time to market. For these emerging markets, the MB platform offers complementary lithography solutions. With powerful productivity benefits, it unlocks the full precision patterning capabilities of EBL and expands the range of lithography options available to IC leaders. ”
