In the delicate and complex process chain of semiconductor manufacturing, photoresist is one of the core materials, and its quality and performance directly determine the performance, yield and reliability of integrated circuits. With the vigorous development of the global semiconductor industry, the market demand for photoresist continues to rise, and the global photoresist market size is expected to exceed $15 billion by 2025. In this context, Wuhan Taizi Micro Optoelectronics Technology Co., Ltd. (hereinafter referred to as "Taizi Micro Company"), a Chinese Optics Valley enterprise, has successfully achieved a major breakthrough in the field of semiconductor special photoresist - its self-developed T150 A photoresist product has successfully passed the mass production verification of semiconductor process, with an ultimate resolution of up to 120nm. This milestone achievement not only marks China's key progress in the field of semiconductor lithography manufacturing, but also wins a valuable place in the competition of domestic photoresist in the global market.
Technological innovation: surpass international similar products and show excellent performance
Taizi Micro's T150 A photoresist products have made a significant breakthrough at the technical level. Its ultimate resolution reaches 120nm, which not only surpasses foreign products such as UV1610, but also shows excellent advantages in key performance indicators such as process tolerance, stability and retention rate after hardening. Specifically, the T150 A photoresist enables precise control of the size and shape of the pattern during the lithography process, ensuring that the microstructure of the integrated circuit is accurately reproduced, which is critical for improving the performance and yield of the integrated circuit. At the same time, its good process tolerance enables more process deviations to be tolerated during the lithography process, thereby improving production efficiency and reducing production costs. In terms of stability, T150 A photoresist can maintain stable performance in the long-term lithography process and avoid performance degradation or deterioration, which is of great significance for ensuring the stability and reliability of the semiconductor manufacturing process. In addition, the retention rate of the film after hardening also reflects the residue of the photoresist after being baked at high temperatures, and the T150 A photoresist also shows excellent performance in this regard, which has a positive effect on improving the reliability and service life of integrated circuits.
Figure: Taizi Micro photoresist T150 A has passed mass production verification with a resolution of 120nm
Industrial value: promote independent and controllable, and seize market opportunities
The successful mass production verification of T150 A photoresist of Taizi Micro Company is of far-reaching significance for the development of China's semiconductor industry. First of all, this achievement breaks the passive situation of domestic semiconductor companies relying on imports for a long time in the field of photoresist, and provides strong support for the realization of independent controllability. Prior to this, domestic semiconductor companies mainly relied on imports in the field of photoresist, which not only increased production costs, but also limited the development space of the industry. The successful mass production verification of T150 A photoresist of Taizi Micro Company enables domestic semiconductor companies to independently master the core technology of photoresist, thereby reducing production costs and enhancing industrial competitiveness.
Secondly, with the rapid development of the global semiconductor industry, the market demand for photoresists continues to grow. The successful mass production verification of T150 A photoresist of Taizi Micro Company has made Chinese semiconductor companies expected to occupy a place in the global photoresist market. According to market research institutes, the global photoresist market size will continue to grow in the next few years and is expected to exceed $15 billion by 2025. In this huge market, Taizi Micro is expected to win more market share with its excellent technical strength and product quality, adding new impetus to the international competitiveness of China's semiconductor industry.
Innovation-led: The core team is deeply engaged in the field of electronic chemicals and continues to promote technological progress
The core R&D team of Taizi Micro Company was founded by the team of Wuhan National Research Center for Optoelectronics of Huazhong University of Science and Technology, and the team members have been deeply engaged in the field of electronic chemicals for more than 20 years and have accumulated rich R&D experience and technical reserves. Professor Zhu Mingqiang, the person in charge of the company, said that Taizi Micro will continue to take innovation as the driving force to promote the continuous progress of China's photoresist technology. In the future, Taizi Micro will also develop a series of KrF and ArF photoresists used in different scenarios to meet the urgent needs of domestic semiconductor companies for high-performance photoresists.
Driven by innovation, Taizi Micro has not only made a major breakthrough in T150 A photoresist, but also actively explored in other fields. For example, Taizi Micro is developing a new generation of photoresist materials to meet the demand for higher resolution and lower cost in future semiconductor manufacturing. In addition, Taizi Micro is also exploring the recycling technology of photoresist to reduce production costs and reduce environmental pollution. These innovative measures not only help to improve the technical level of Taizi Micro, but also provide strong support for the sustainable development of China's semiconductor industry.
Looking to the future: the rise of domestic photoresist will help China's semiconductor industry reach new heights
The successful mass production verification of T150 A photoresist of Taizi Micro is an important embodiment of the independent innovation capability of China's semiconductor industry. This breakthrough not only improves the technical level of domestic photoresist, but also contributes Chinese wisdom to the development of the global semiconductor industry. With the continuous maturity of technology and the expansion of the market, Taizi Micro is expected to become an important player in the field of semiconductor photoresist in China and even the world.
In the future, with the rapid development of the global semiconductor industry and the continuous progress of technology, China's semiconductor industry will usher in more development opportunities and challenges. In this context, as one of the leading enterprises in domestic photoresist, Taizi Micro will continue to give full play to its advantages in technological innovation and market expansion, and contribute more to the rise of China's semiconductor industry. At the same time, we also expect more Chinese semiconductor companies to join the ranks of independent innovation and jointly promote the prosperity and development of China's semiconductor industry.
To sum up, the successful mass production verification of T150 A photoresist of Taizi Micro Company is not only an important breakthrough in the field of photoresist made by China's semiconductor industry, but also an important symbol of China's semiconductor industry moving towards a new era of independence and control. In the future, with the continuous progress of technology and the continuous expansion of the market, domestic photoresist will play an increasingly important role in the development of China's semiconductor industry, helping China's semiconductor industry to reach a new height.
